logo
vr
Quality High-Precision Single Station Spin Coater with Customizable Speed up to 15,000 rpm and Multi-Step Recipe Control for R&D Labs factory
<
Quality High-Precision Single Station Spin Coater with Customizable Speed up to 15,000 rpm and Multi-Step Recipe Control for R&D Labs factory
Quality High-Precision Single Station Spin Coater with Customizable Speed up to 15,000 rpm and Multi-Step Recipe Control for R&D Labs factory
Quality High-Precision Single Station Spin Coater with Customizable Speed up to 15,000 rpm and Multi-Step Recipe Control for R&D Labs factory
Quality High-Precision Single Station Spin Coater with Customizable Speed up to 15,000 rpm and Multi-Step Recipe Control for R&D Labs factory
Quality High-Precision Single Station Spin Coater with Customizable Speed up to 15,000 rpm and Multi-Step Recipe Control for R&D Labs factory
>

High-Precision Single Station Spin Coater with Customizable Speed up to 15,000 rpm and Multi-Step Recipe Control for R&D Labs

High-Precision Single Station Spin Coater with Customizable Speed up to 15,000 rpm and Multi-Step Recipe Control for R&D Labs
High-Precision Single Station Spin Coater for R&D Labs This customizable single-station spin coater is designed for uniform thin-film deposition of photoresist, polyimide, sol-gel, nanoparticles, and other functional coatings onto substrates. Available in high-precision R&D, integrated hotplate, and ...
Place of Origin:CHINA
Brand Name:OSMANUV
Certification:ISO9001
Model Number:OSMANUV
Minimum Order Quantity:1 SET
Price:Negotiation
Product Custom Attributes
Highlight

Customizable Speed Spin Coater

,

Multi-Step Recipe Spin Coating Machine

,

High-Precision Single Station Spin Coater

Controlsystem:
PLC Touch Screen Control
Target Material:
Wafer
Lamp Type:
Carbon Fiber Type
Power Supply:
380V/50Hz
Processing Thickness:
3-80mm
Coating Material:
Water Based Barrier Coat
Embellishment:
Spot UV , Texture , Sandy Effect
Product Size:
Diameter 350-420mm
Product Description
High-Precision Single Station Spin Coater for R&D Labs
This customizable single-station spin coater is designed for uniform thin-film deposition of photoresist, polyimide, sol-gel, nanoparticles, and other functional coatings onto substrates. Available in high-precision R&D, integrated hotplate, and large-format configurations.
The system is fully customizable in spin speed range, substrate size, chuck type, bowl material, and automation level. Spin coating uses centrifugal force to spread a liquid coating evenly across a substrate, achieving film thicknesses from nanometers to several microns with exceptional uniformity.
Key advantages include exceptional speed stability (< ±1% fluctuation), low vibration operation, and a chemical-resistant process bowl (available in PP, PTFE, or stainless steel 316L). The compact benchtop design is ideal for research laboratories, pilot lines, and small-batch production environments. The modular architecture supports future upgrades, including multiple dispense nozzles, nitrogen purge, and in-situ heating modules.
Technical Specifications
Parameter High-Precision R&D Model Integrated Hotplate Model Large-Format / Production Model
Substrate size (customizable) Up to 200 mm dia. / square Up to 200 mm dia. Up to 450 mm / 18"
Spin speed range (customizable) 100 - 12,000 rpm 100 - 12,000 rpm Up to 15,000 rpm
Speed accuracy ±1 rpm or ±0.5% ±0.5% ±0.1% (servo motor)
Acceleration range (customizable) 100 - 10,000 rpm/s Programmable 1 - 50,000 rpm/s
Program steps (customizable) 10 programs, 20 steps each Up to 100 steps/program Unlimited customizable
Chuck type (customizable) Vacuum (aluminum/PTFE/ceramic) Vacuum (aluminum) Vacuum / mechanical clamp
Bowl material (customizable) PP / PTFE / Stainless steel 316L PP / PTFE Stainless steel
Hot plate temperature (optional) N/A Ambient - 300°C Optional
Control interface 4.3" LCD / 7" HMI 7" HMI touchscreen PLC + HMI / PC-based
Data export USB (optional) USB / Ethernet USB / Ethernet / Modbus
Power supply (customizable) 110/220V, 50/60Hz 110/220V 220/380V, 50/60Hz
Typical application Semiconductor, OLED, perovskite Photoresist + bake Industrial panels, large wafers
Applications
  • Semiconductor & MEMS: Photoresist coating, electron beam lithography, spin-on glass (SOG)
  • Optoelectronics: OLED, quantum dot thin films, anti-reflective coatings
  • Materials science: Sol-gel deposition, nanoparticle films, polymer coatings
  • Biotechnology: Biosensor fabrication, microfluidic device coating
  • Renewable energy: Perovskite solar cells, thin-film photovoltaic
  • Optical industry: Lens hard coating (with UV curing option)
Key Features
  • High precision spin control: High-torque brushless motor with ±0.5% speed accuracy and programmable acceleration ensures repeatable, uniform coating
  • R&D-focused design: Multi-step recipe programming and data logging capabilities for systematic process development
  • Versatile fixturing: Customizable chucks and fixtures securely hold complex geometries or fragile substrates
  • Chemical-resistant construction: PTFE, PP, or stainless steel bowls for aggressive solvents
  • User-friendly interface: Intuitive touchscreen HMI with recipe storage for quick recall of optimized parameters
  • Compact footprint: Benchtop design saves valuable lab or production floor space
  • Safety interlocks: Automatic stop when lid is opened during operation
  • Data traceability: Recipe storage, real-time monitoring, USB/Ethernet export
Customization Options
This single-station spin coater is highly customizable to meet your specific application requirements:
  • Spin speed range: From 50 rpm up to 15,000 rpm - customizable
  • Chuck design & size: Custom-machined vacuum chucks for round (up to 450 mm), square, rectangular, or irregular substrates - fully customizable
  • Bowl material: Polypropylene (PP), PTFE, stainless steel 316L - customizable for solvent resistance
  • Fixture type: Vacuum chuck, mechanical clamp, or custom 3D-printed holders - customizable
  • Dispense system: Manual syringe / automated syringe pump / solenoid valve / multi-nozzle array - customizable
  • Heating integration: Optional in-situ IR heaters or hot plates up to 300°C - customizable
  • Environmental control: Inert gas purge (N₂), humidity control, glovebox integration - customizable
  • Software: Recipe management, data logging, USB/Ethernet export - customizable
  • Automation level: Fully manual to semi-automatic with automated dispense and cycle control - customizable
  • Safety: Interlocked enclosures, emergency stop, spill containment - customizable
Support and Services
  • Free process consulting and material testing - send us your substrates
  • Custom fixture design and engineering services
  • On-site installation and commissioning (customizable support packages)
  • Operator training program included
  • Remote troubleshooting within 24 hours via video call
  • 18-month warranty on motor and controller, 12-month on accessories
  • Spare parts availability from regional warehouses (US/EU/Asia)
  • Lifetime technical support via phone, email, or chat
Packing and Shipping
  • Packing: Anti-static foam + reinforced wooden case (with desiccant for moisture-sensitive components)
  • Standard model lead time: 15-25 days after order confirmation
  • Custom configuration lead time: 30-45 days (longer for custom chucks or bowls)
  • Shipping: FOB Shanghai / CIF by sea, air, or rail
  • Customizable: Export crating, custom labeling, destination port documentation
Frequently Asked Questions
Q1: What is the maximum substrate size this spin coater can handle?
A: Standard R&D models handle up to 150-200 mm (6-8") diameter wafers. For large-format applications, we offer customizable chucks up to 450 mm (18") substrates. Square substrates up to 150×150 mm are also supported.
Q2: Can I use this spin coater for non-round substrates?
A: Yes. We offer customizable vacuum chucks and mechanical fixtures for square, rectangular, and irregularly shaped substrates. Custom chucks can also be 3D-printed to fit specific product geometries. Please provide your substrate dimensions for custom fixture design.
Q3: What is the typical coating thickness uniformity?
A: With proper process optimization, thickness uniformity can reach < ±1% across the substrate. Results vary by material viscosity, spin parameters, and substrate geometry. We offer free lab testing to confirm your specific application.
Related Products