High-Precision 12-Station Automatic Spin Coater for Customizable Semiconductor & Perovskite Film Deposition

This 12-station spin coater is designed for high-throughput thin film deposition, supporting wafers, glass, and flexible substrates. Each station offers independent speed, acceleration, and coating time settings with closed-loop control achieving ±1 rpm accuracy. The number of stations, dispensing method, chamber size, and exhaust system are all customizable, making it ideal for both R&D and pilot production.

• Perovskite solar cell films
• Photoresist coating (semiconductor lithography)
• Sol-gel thin films
• OLED & quantum dot emitting layers
• Biosensor coatings
• Customizable for non-planar or flexible substrates

• System-level and process-level customization
• Number of stations, layout, dispensing path
• Chamber size and material (acid-resistant, solvent-resistant)
• Automatic cleaning & waste solvent recovery system
• Heating / UV / IR post-coating curing modules
• Factory MES/ERP data interface integration

• 12 independently driven stations with separate motors & control
• High acceleration response - reaches set speed in <0.5 seconds
• Multi-point dispensing programming - supports dynamic/static dispensing
• Cross-contamination prevention - independent exhaust channels per station
• One-click recipe recall with optional barcode scanning startup
• Customizable safety interlock & e-stop logic

• Global remote support (TeamViewer/VPN)
• On-site installation & training (optional)
• Process consulting - viscosity/speed/thickness modeling
• Local spare parts stock - customizable spare parts kit available
• 18-month warranty (excluding intentional damage)

• Shockproof wooden case (ISTA standard compliant)
• Desiccant & humidity indicator included inside
• Shipping methods: sea / air / land - customizable export labeling & fumigation certificate available
• Lead time: 4 weeks for standard models, 6-8 weeks for customized models