High-Precision Single Station Spin Coater – Customizable Ramp & Speed Profile for R&D Labs

Product Details:

Place of Origin: CHINA
Brand Name: OSMANUV
Certification: ISO9001
Model Number: Specification

Payment & Shipping Terms:

Minimum Order Quantity: 1 set
Price: Negotiation
Packaging Details: WOOD PACKAGING
Delivery Time: 30-45days
Payment Terms: T/T
Supply Ability: Negotiation
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Detail Information

Die Head: Adjustable Substrate: Fiber Cement Board
Working Station: Two Heating Source: Electric IR Heating
Material Compatibility: Compatible With Various Pulp Molded Products Drying Time: Adjustable
Coating Method: Spray Coating / Roller Coating Machine Weight: Around 500-800 Kg
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Product Description

High-Precision Single Station Spin Coater – Customizable Ramp & Speed Profile for R&D Labs
Product Overview

Our single station spin coater is engineered for uniform thin film deposition of photoresist, polyimide, sol-gel, and nanoparticles. It features exceptional speed stability (< ±1% fluctuation), low vibration operation, and a chemical-resistant bowl. The compact design makes it ideal for R&D laboratories, pilot lines, and small-batch production environments.

Customizable options include: chuck size, bowl material (PTFE/PP/stainless steel), motor type (brushless DC/servo), and exhaust port position.

Technical Specifications
Parameter Standard Range Customizable Option
Substrate size 10 mm - 150 mm dia. Up to 200 mm square
Speed range 100 - 12,000 rpm 50 - 15,000 rpm
Acceleration 100 - 10,000 rpm/s Customizable ramp profiles
Speed stability ±0.5% ±0.1% (servo motor)
Program steps 10 programs, 20 steps each Unlimited steps customizable
Chuck type Vacuum chuck (aluminum) PTFE / ceramic / custom pattern
Bowl material Polypropylene (PP) PTFE / stainless steel 316L
Exhaust port Ø50 mm rear Left / right / dual ports
Motor type Brushless DC Servo motor customizable
Display 4.3" LCD 7" HMI touch screen
Power 220V/50Hz or 110V/60Hz Available for any voltage
Applications
  • Semiconductor wafer coating (photoresist, ARC)
  • OLED and quantum dot thin films
  • Sol-gel and spin-on glass (SOG)
  • Biosensor and polymer film deposition
  • Perovskite solar cell fabrication
Also suitable for customizable high-viscosity or high-temperature processes.
Customization Options
  • Bowl inner diameter and drain groove design
  • Vacuum chuck shape for non-standard substrates (e.g., rectangular, broken wafers)
  • Automatic cover with interlock
  • Nitrogen blow-dry during spin
  • Multiple dispense nozzle brackets
  • Special coating programs (e.g., reverse spin, pulse spin)
Key Features
  • High acceleration repeatability for uniform edge bead
  • Real-time speed curve display and data export (CSV)
  • Easy-swap chuck design without tools
  • Chemical-resistant and seamless stainless steel or PTFE bowl
  • Autofill rinse function for cleaning between runs
  • Customizable recipe library for multiple operators
Support and Services
  • Installation guide and calibration video included
  • Remote troubleshooting within 24 hours
  • 18 months warranty on motor and controller
  • On-site training (available for customizable packages)
  • Spare parts shipment from local warehouses (US/EU/Asia)
Packing and Shipping
  • Packing: Foam-lined wooden case with anti-static bag
  • Dimensions (carton): 55×45×45 cm
  • Gross weight: approx. 22 kg
  • Shipping: DHL / FedEx / UPS air freight; Sea freight available for bulk orders
  • Customizable labeling and export packaging for drop-shipping
Frequently Asked Questions
Q1: Can the speed ramp be customized for multiple steps?
Yes. Up to 20-step profiles are customizable per recipe.
Q2: Does it fit 100 mm round or square substrates?
Yes. We offer customizable chucks for square, rectangular, and irregular substrates.
Q3: What is the lead time for a custom bowl material?
Standard units ship in 7 days. Customizable bowls (e.g., PTFE) require 3-4 weeks.

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