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24-Position Rotary Spin Coater with Customizable Substrate Sizes and Programmable Spin Profiles for High-Throughput Thin-Film Deposition
Product Details:
| Place of Origin: | CHINA |
| Brand Name: | OSMANUV |
| Certification: | ISO9001 |
| Model Number: | Specification |
Payment & Shipping Terms:
| Minimum Order Quantity: | 1 set |
|---|---|
| Price: | Negotiation |
| Packaging Details: | WOOD PACKAGING |
| Delivery Time: | 30-45 days |
| Payment Terms: | T/T |
| Supply Ability: | Negotiation |
|
Detail Information |
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| Material: | Pulp | Coating Means: | DOD Inkjet Heads |
|---|---|---|---|
| Heating Source: | Electric IR Heating | Coating Area: | Large Area |
| Heating Method: | Electric | Coating Thickness Control: | Adjustable |
| Dimension: | As Customer Requirement | Model: | OSM-XT-450T |
| Production Line Integration: | Can Be Integrated Into Pulp Molding Production Line | ||
Product Description
Compact 24-Position Rotary Spin Coater | Customizable Substrate Sizes & Spin Programs for R&D and Pilot Production
Product Overview
This 24-station spin coater is designed for high-throughput thin-film deposition of photoresist, polymers, nanoparticles, and sol-gel materials. Each station operates independently or synchronously. The system supports customizable spin profiles (acceleration, duration, speed) for each station, making it ideal for both R&D and production environments.
Technical Specifications
| Parameter | Value / Range | Customization Option |
|---|---|---|
| Number of stations | 24 | ✔ Customizable (16/24/32 stations) |
| Substrate size | Up to 12" wafer or 300×300 mm panel | ✔ Customizable chuck size |
| Spin speed range | 100 - 12,000 rpm | ✔ Programmable per station |
| Speed accuracy | ±1 rpm | - |
| Acceleration range | 100 - 10,000 rpm/s | ✔ Adjustable per recipe |
| Spin time range | 1 - 999 sec / step | ✔ Customizable steps |
| Dispense volume | 0.1 - 20 mL per nozzle | ✔ Customizable nozzle type |
| Motor type | Brushless DC servo | - |
| Coating uniformity | ±3% (across 24 stations) | ✔ Upgradable to ±1% |
| Exhaust flow | 150 - 500 m³/h | ✔ Customizable exhaust interface |
| Power supply | 220V / 50-60 Hz / 3.5 kW | ✔ Customizable voltage |
| Dimensions (L×W×H) | 1800×1200×900 mm | ✔ Customizable footprint |
| Weight | 520 kg | - |
Applications
- Semiconductor wafer coating (photoresist)
- OLED & perovskite solar cell fabrication
- Bio-chip & polymer film preparation
- Anti-reflective coating for optics
- Nanomaterial deposition (graphene, quantum dots)
- R&D multi-condition screening (24 different parameters simultaneously)
Customization Options
We offer full customization:
- Station count: 8 / 12 / 16 / 24 / 32 stations
- Substrate shape & size: round wafers, square panels, irregular substrates
- Dispense system: single-needle, multi-nozzle, spray, or inkjet
- Environment control: humidity, temperature, particle filtration
- Automation level: manual load, semi-auto, full inline integration
- Software: customized recipe structure, barcode scanning, data export to MES
Key Features
- Individual station control with independent spin motors
- Touchscreen with recipe library (up to 999 recipes)
- Real-time speed & time monitoring per station
- Anti-drip vacuum detection for substrate hold
- Automatic solvent dispenser sync
- Low vibration and acoustic enclosure
- Emergency stop and interlock protection
- Customizable exhaust and waste collection tank
Support and Services
- Installation and on-site training
- 18-month standard warranty (extendable)
- Remote debugging and IoT support option
- Annual calibration and preventive maintenance plan
- Spare parts supply for ≥10 years
- Custom software development support
Packing and Shipping
- Packing: Anti-static vacuum-sealed + plywood export case (shock-proof, moisture-proof)
- Shipping method: FOB / CIF by sea, air (express optional for benchtop units)
- Lead time: 30-45 working days after order confirmation (customization adds 15 days)
- Documents included: User manual, calibration certificate, CE declaration
Frequently Asked Questions
Q1: Can the 24 stations run different spin programs simultaneously?
A: Yes. Each station supports a customizable independent recipe (speed, time, acceleration).
Q2: What substrate sizes can I customize?
A: From 5×5 mm chips to 300×300 mm panels or 12" wafers. Please provide your substrate drawing.
Q3: Is this machine cleanroom compatible?
A: Yes. Class 100 (ISO 5) compatible with optional HEPA/ULPA filter module.
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